http://www.globalwaterintel.com/arch...recession.html
Quote:
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Industry statistics indicate that creating an integrated circuit on a 300mm wafer requires approximately 2,200 gallons of water in total, of which 1,500 gallons is ultrapure water. UPW flow rates for a fab plant can range from 500 to 2,000 gallons per minute.
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The article states at the end that "Wastewater from semiconductor plants contains small amounts of arsenic, antimony and phosphorous, hydrogen peroxide, nitric acid, sulphuric acid and hydrofluoric acid. All wastewater is captured; toxic chemicals are removed and acids neutralized." but there is no mention of what is done with toxic chemicals once they are removed. Presumably they still need to be disposed of.